| 摘要 |
A metal foil for electromagnetic shielding, comprising: a metal foil base, an Sn-Ni alloy layer formed on one or both surfaces of the base, and an oxide layer formed on a surface of the Sn-Ni alloy layer, wherein the Sn-Ni alloy layer includes 20 to 80% by mass of Sn and has a thickness of 30 to 500 nm, and wherein when an analysis in a depth direction is carried out by an XPS being the depth from an outermost surface as X nm, and an atomic percentage (%) of Sn is represented by A Sn (X), an atomic percentage (%) of Ni is represented by A Ni (X), an atomic percentage (%) of oxygen is represented by A o (X), and X is defined to be X o when A o (X) = 0, 30 nm => X o =>0.5 nm, and 0.4 =>ˆ«A Ni (X)dx/ˆ«A Sn (X)dx => 0.05 in a section [0, X 0 ] is satisfied. |
