| 摘要 |
A method for producing micropores which is characterized in that: the inside of a substrate (11) is irradiated with laser light (L) that has a pulse duration of not more than picosecond order, so that a first structure modified portion (12) is formed at the focal point where the laser light (L) is collected or around the focal point; the first structure modified portion (12) is subjected to a heat treatment, so that a second structure modified portion (13), in which the first structure modified portion (12) is extinct or modified, is formed in a part of the first structure modified portion (12); and regions of the first structure modified portion (12) other than the second structure modified portion (13) are selectively etched, so that the first structure modified portion (12) is removed, thereby forming micropores (14). |
