发明名称 METHOD FOR DIRECT REUSE GOLD SPUTTERING TARGET OF A SPENT GOLD SPUTTERING TARGET USING COLD SPRAY TECHNIQUE
摘要 The present invention relates to a method for manufacturing a target to be directly reused by using a spent gold (Au) sputtering target through a cold spray scheme. The method includes the steps of: S1) washing or cutting the surface of a spent Au sputtering target; S2) inputting the washed or cut spent Au sputtering target into a coil spray mold; S3) forming a densified coating layer on the spent Au sputtering target inputted into the mold by using raw powder cold spray; and S4) processing the surface of the coating layer. So, the manufacturing time and energy can be reduced.
申请公布号 KR20160050968(A) 申请公布日期 2016.05.11
申请号 KR20140150219 申请日期 2014.10.31
申请人 HEE SUNG METAL LTD. 发明人 KWON, OH JIB;HONG, GIL SOO;YANG, SEUNG HO;YOON, WON KYU
分类号 H01L21/203 主分类号 H01L21/203
代理机构 代理人
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