发明名称 |
METHOD FOR DIRECT REUSE GOLD SPUTTERING TARGET OF A SPENT GOLD SPUTTERING TARGET USING COLD SPRAY TECHNIQUE |
摘要 |
The present invention relates to a method for manufacturing a target to be directly reused by using a spent gold (Au) sputtering target through a cold spray scheme. The method includes the steps of: S1) washing or cutting the surface of a spent Au sputtering target; S2) inputting the washed or cut spent Au sputtering target into a coil spray mold; S3) forming a densified coating layer on the spent Au sputtering target inputted into the mold by using raw powder cold spray; and S4) processing the surface of the coating layer. So, the manufacturing time and energy can be reduced. |
申请公布号 |
KR20160050968(A) |
申请公布日期 |
2016.05.11 |
申请号 |
KR20140150219 |
申请日期 |
2014.10.31 |
申请人 |
HEE SUNG METAL LTD. |
发明人 |
KWON, OH JIB;HONG, GIL SOO;YANG, SEUNG HO;YOON, WON KYU |
分类号 |
H01L21/203 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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