发明名称 |
SUBSTRATE HEAT TREATMENT APPARATUS AND SUBSTRATE TRANSFER TRAY USED IN SUBSTRATE HEAT TREATMENT |
摘要 |
A substrate heat treatment apparatus that can suppress generation of the surface roughening of a substrate to which heat treatment is performed. The apparatus is provided with a heater for performing heat treatment to a substrate arranged in a treatment chamber, and the apparatus performs heat treatment to the substrate. A susceptor is arranged between the heater and the substrate, and susceptor surface on a side whereupon the substrate is arranged is covered with a member which does not degas while the substrate heat treatment is performed. A heat receiving body for receiving heat from the heater through the susceptor is arranged on a side which faces the susceptor by having the substrate in between, and a surface of the heat receiving body on the side whereupon the substrate is arranged is covered with a member which does not degas while the substrate heat treatment is performed. |
申请公布号 |
EP1804284(B1) |
申请公布日期 |
2016.05.11 |
申请号 |
EP20050795511 |
申请日期 |
2005.10.18 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
SHIBAGAKI, MASAMI;KUREMATSU, YASUMI |
分类号 |
H01L21/324;H01L21/26;H01L21/673;H01L21/687 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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