| 摘要 |
Embodiments include a chemical processing apparatus and method using the chemical processing apparatus to treat a substrate by means of a mono-energetic space-charge neutralized neutral beam-activated chemical process including a substantially anisotropic beam of neutral particles. The chemical processing apparatus comprises a first plasma chamber for forming a first plasma at a first plasma potential, and a second plasma chamber for forming a second plasma at a second plasma potential higher than the first plasma potential, wherein the second plasma is formed using electron flux from the first plasma. Furthermore, the chemical processing apparatus comprises an ungrounded dielectric (insulator) neutralizer grid configured to expose a substrate in the second plasma chamber to the substantially anisotropic beam of neutral particles traveling from the neutralizer grid. |
