发明名称 Non-volatile memory device
摘要 A non-volatile memory device includes an isolation layer formed over a substrate to define an active region, a floating gate formed over the substrate, a selection gate formed over the substrate on one side of the floating gate and formed to be adjacent to the floating gate with a first gap from the floating gate, a control plug formed over the isolation layer on the other side of the floating gate and formed to be adjacent to the floating gate with a second gap from the floating gate, and a charge blocking layer formed to gap-fill the first gap and the second gap.
申请公布号 US9337287(B2) 申请公布日期 2016.05.10
申请号 US201314135141 申请日期 2013.12.19
申请人 SK Hynix Inc. 发明人 Park Sung-Kun
分类号 H01L29/788;H01L29/423;H01L27/115 主分类号 H01L29/788
代理机构 IP & T Group LLP 代理人 IP & T Group LLP
主权项 1. A non-volatile memory device, comprising: an isolation layer formed over a substrate to define an active region; a floating gate formed over the substrate; a selection gate formed over the substrate on one side of the floating gate and formed to be adjacent to the floating gate with a first gap from the floating gate; a control plug formed over the isolation layer on the other side of the floating gate and formed to be adjacent to the floating gate with a second gap from the floating gate; and a charge blocking layer formed to gap-fill the first gap and the second gap, wherein the control plug and the selection gate receive a same bias voltage, and the floating gate is coupled with the control plug and the selection gate, in response to the same bias voltage being applied to the control plug and the selection gate.
地址 Gyeonggi-do KR