PHOTO-CURABLE COMPOSITION, ORGANIC PROTECTIVE LAYER COMPRISING THE SAME, AND APPARATUS COMPRISING THE SAME

摘要

The present invention relates to a photo-curable composition including a photo-curable monomer and a photopolymerization initiator. A POC parameter value represented by Formula 1 is between 0.1 and 0.35, inclusive. In Formula, Pc_n refers to the number of aromatic rings of each monomer, Oc_n refers to the number of O atoms and S atoms of each monomer, Wr_n refers to wt% of each monomer of total monomers, and Mw_n refers to a weight average molecular weight of a monomer. An organic protective layer having high plasma resistance may be produced, and a device is protected from influences of an environment including moisture and gas, so reliability may be ensured.