FinFET with active region shaped structures and channel separation

摘要

A semiconductor structure in fabrication includes a n-FinFET and p-FinFET. Stress inducing materials such as silicon and silicon germanium are epitaxially grown into naturally diamond-shaped structures atop the silicon fins of the n-FinFET and p-FinFET areas. The diamond structures act as the source, drain and channel between the source and drain. The diamond structures of the channel are selectively separated from the fin while retaining the fin connections of the diamond-shaped growth of the source and the drain. Further fabrication to complete the structure may then proceed.

主权项

1. A transistor, comprising:
a semiconductor substrate; at least one fin, each fin comprising an active region having a source, a drain and a channel between the source and the drain; wherein the source, drain and channel of the active region of at least some of the at least one fin comprises a plurality of naturally shaped semiconductor structures; and wherein the plurality of naturally shaped semiconductor structures of the channel are separated from the corresponding fin therebelow, while the plurality of naturally shaped semiconductor structures of the source and drain are connected to the corresponding fin therebelow.