发明名称 |
Semiconductor device including a semiconductor sheet unit interconnecting a source and a drain |
摘要 |
A semiconductor device includes a substrate, a first source/drain (S/D), a second S/D, and a semiconductor sheet unit. The substrate extends in a substantially horizontal direction. The first S/D is formed on the substrate. The second S/D is disposed above the first S/D. The semiconductor sheet unit extends in a substantially vertical direction and interconnects the first S/D and the second S/D. A method for fabricating the semiconductor device is also disclosed. |
申请公布号 |
US9337263(B2) |
申请公布日期 |
2016.05.10 |
申请号 |
US201414312739 |
申请日期 |
2014.06.24 |
申请人 |
Taiwan Semiconductor Manufacturing Company Limited |
发明人 |
Wu Jiun-Peng;Ohtou Tetsu;Tsai Ching-Wei;Wang Chih-Hao;Liu Chi-Wen |
分类号 |
H01L21/336;H01L27/11;H01L29/775;H01L29/06;H01L21/8234 |
主分类号 |
H01L21/336 |
代理机构 |
Jones Day |
代理人 |
Jones Day |
主权项 |
1. A semiconductor device comprising:
a substrate extending in a substantially horizontal direction; a source unit including a plurality of sources; a drain unit including a plurality of drains, wherein one of the source unit and the drain unit is formed on the substrate; a semiconductor sheet unit extending in a substantially vertical direction and interconnecting the source unit and the drain unit; and a nanowire unit extending in the substantially vertical direction, interconnecting the source unit and the drain unit, and having a cross-sectional shape of a dot in a top view. |
地址 |
Hsinchu TW |