发明名称 Semiconductor device including a semiconductor sheet unit interconnecting a source and a drain
摘要 A semiconductor device includes a substrate, a first source/drain (S/D), a second S/D, and a semiconductor sheet unit. The substrate extends in a substantially horizontal direction. The first S/D is formed on the substrate. The second S/D is disposed above the first S/D. The semiconductor sheet unit extends in a substantially vertical direction and interconnects the first S/D and the second S/D. A method for fabricating the semiconductor device is also disclosed.
申请公布号 US9337263(B2) 申请公布日期 2016.05.10
申请号 US201414312739 申请日期 2014.06.24
申请人 Taiwan Semiconductor Manufacturing Company Limited 发明人 Wu Jiun-Peng;Ohtou Tetsu;Tsai Ching-Wei;Wang Chih-Hao;Liu Chi-Wen
分类号 H01L21/336;H01L27/11;H01L29/775;H01L29/06;H01L21/8234 主分类号 H01L21/336
代理机构 Jones Day 代理人 Jones Day
主权项 1. A semiconductor device comprising: a substrate extending in a substantially horizontal direction; a source unit including a plurality of sources; a drain unit including a plurality of drains, wherein one of the source unit and the drain unit is formed on the substrate; a semiconductor sheet unit extending in a substantially vertical direction and interconnecting the source unit and the drain unit; and a nanowire unit extending in the substantially vertical direction, interconnecting the source unit and the drain unit, and having a cross-sectional shape of a dot in a top view.
地址 Hsinchu TW