发明名称 Wiring substrate and method for manufacturing the wiring substrate
摘要 A wiring substrate includes a first insulating layer, a first magnetic layer that is a first plating film formed on the first insulating layer, a flat coil formed on the first magnetic layer, and a second magnetic layer that is a second plating film formed on the flat coil.
申请公布号 US9336938(B2) 申请公布日期 2016.05.10
申请号 US201313857226 申请日期 2013.04.05
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 Fujii Tomoharu
分类号 H01F5/00;H01F27/30;H01L27/08;H01F17/00;H01F41/04 主分类号 H01F5/00
代理机构 IPUSA, PLLC 代理人 IPUSA, PLLC
主权项 1. A wiring substrate comprising: a first insulating layer; a first magnetic layer that is a first plating film formed on the first insulating layer; a flat coil formed on the first magnetic layer, the flat coil including a coil part having one or more coils; a second magnetic layer that is a second plating film formed on the flat coil and an insulating part formed in a space between the one or more coils of the coil part from a plan view, the insulating part including a side surface covered by the flat coil, an upper surface of the insulating part being flush with an upper surface of the flat coil; wherein the insulating part is formed between the one or more coils except at a periphery of one end of the coil part and a portion of a periphery of another end of the coil part from the plan view, wherein the second magnetic layer is formed directly on top of the insulating part, wherein the flat coil is a third plating film.
地址 Nagano JP