Processing liquid for suppressing pattern collapse of fine metal structure and method for producing fine metal structure using same

摘要

There are provided a processing liquid for suppressing pattern collapse of a fine metal structure, containing at least one member selected from an imidazolium halide having an alkyl group containing 12, 14 or 16 carbon atoms, a pyridinium halide having an alkyl group containing 14 or 16 carbon atoms, an ammonium halide having an alkyl group containing 14, 16 or 18 carbon atoms, a betaine compound having an alkyl group containing 12, 14 or 16 carbon atoms, and an amine oxide compound having an alkyl group containing 14, 16 or 18 carbon atoms, and a method for producing a fine metal structure using the same.

主权项

1. A method for producing a fine metal structure, comprising:
wet etching or dry etching, rinsing contamination formed after said wet etching or dry etching, subsequently rinsing with a processing liquid, rinsing with pure water after rinsing with said processing liquid, and drying immediately after said rinsing with pure water, wherein the processing liquid comprises at least one compound selected from the group consisting of: an imidazolium halide comprising an alkyl group containing 12, 14, or 16 carbon atoms; a pyridinium halide comprising an alkyl group containing 14 or 16 carbon atoms; a betaine comprising an alkyl group containing 12, 14, or 16 carbon atoms; and an amine oxide comprising an alkyl group containing 14, 16, or 18 carbon atoms, wherein a content of said at least one compound in the processing liquid is from 10 ppm to 10% by mass.