| 发明名称 | Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer | ||
| 摘要 | A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit. | ||
| 申请公布号 | US9335631(B2) | 申请公布日期 | 2016.05.10 |
| 申请号 | US201414446282 | 申请日期 | 2014.07.29 |
| 申请人 | Samsung Display Co., Ltd. | 发明人 | Lee Ki-Beom;Yun Sang-Hyun;Lee Hi-Kuk;Chang Jae-Hyuk;Kim Chang-Hoon;Park Jung-In |
| 分类号 | G03F7/004;G03F7/038;G03F7/40;C08F220/30 | 主分类号 | G03F7/004 |
| 代理机构 | Lewis Roca Rothgerber Christie LLP | 代理人 | Lewis Roca Rothgerber Christie LLP |
| 主权项 | 1. A photosensitive resin composition comprising: an acid-labile resin of about 5 wt % to about 25 wt %; a monomer of about 5 wt % to about 10 wt %; a photoacid generator of about 5 wt % to about 10 wt %; a photoreaction accelerator of about 1 wt % to about 5 wt %; and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit comprising an acid group and a protecting group, the protecting group configured to protect the acid group. | ||
| 地址 | Yongin-si KR | ||