发明名称 MANUFACTURING METHOD FOR FUNCTIONAL FILM, AND FUNCTIONAL FILM
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a functional film that is reduced in thickness, superior in terms of surface flatness and smoothness, and free from wavy wrinkles, and to provide such a functional film.SOLUTION: A functional film manufacturing method includes forming a coating layer by coating a functional layer-forming composition containing an ultraviolet-curable compound on a base material film, and forming a functional layer by curing the ultraviolet-curable compound by means of ultraviolet irradiation, where the base material film has a thickness of 5-50 μm. The total irradiance of the ultraviolet irradiation is no less than 100 mJ/cm, and the ultraviolet irradiation is performed such that the maximum illuminance during the time till cumulative irradiance reaches the first 5 mJ/cmis in a range of 5-50 mW/cm.SELECTED DRAWING: None
申请公布号 JP2016071086(A) 申请公布日期 2016.05.09
申请号 JP20140199457 申请日期 2014.09.29
申请人 FUJIFILM CORP 发明人 IWASAKI TATSUYA;SUZUKI MASAAKI
分类号 G02B1/10;B05D3/06;B05D7/24;B32B27/16;C08J7/04;G02B5/02 主分类号 G02B1/10
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