SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To inhibit a decrease in a temperature of a process liquid when a substrate and a substrate holder are immersed in the process liquid, without deteriorating throughput of substrate processing.SOLUTION: A substrate processing apparatus according to the present embodiment comprises: a holder stocker 41 for storing a substrate holder 80 and a heating device 44 provided in the holder stocker 41, for heating the substrate holder 80 stored in the holder stocker 41.SELECTED DRAWING: Figure 7