| 发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which an excellent resist pattern can be formed.SOLUTION: The radiation-sensitive resin composition comprises a polymer having a structural unit of formula (1), a photoacid generator, and a solvent.SELECTED DRAWING: None |
| 申请公布号 |
JP2016071206(A) |
申请公布日期 |
2016.05.09 |
| 申请号 |
JP20140201681 |
申请日期 |
2014.09.30 |
| 申请人 |
JSR CORP |
发明人 |
OSAKI HITOMI |
| 分类号 |
G03F7/039;C08F28/02;G03F7/038 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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