| 摘要 |
PROBLEM TO BE SOLVED: To suppress a splash in heating when silica glass is used as a vapor deposition material in performing vacuum deposition.SOLUTION: A vapor deposition material using SiOas a main component for thin film formation is used, the vapor deposition material being amorphous, being configured to have an existence ratio of an OH-group/Si-O coupling of a predetermined value or less to suppress a generation of a splash with a main component of Hby making it hard to react an OH-group with a H-group, and also including both amorphous and crystalline, of which boiling points are different, to avoid a state in which the splash likely occurs.SELECTED DRAWING: Figure 1 |
