发明名称 |
MEMS DEVICE AND MEMS DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To inhibit deterioration in gas adsorption capability in an adsorption layer and further inhibit a decrease in vacuum level of an internal space.SOLUTION: A MEMS device comprises: a substrate; an element part which is provided on the substrate and has a movable part; a joining part which is provided on the substrate to surround the element part; and a lid part whose substrate side surface is partially joined to the joining part to form an internal space including the element part. The lid part has a plurality of recesses on the substrate side surface at a portion opposite to the internal space and a film part on the substrate side surface at a portion including at least the plurality of recesses. The film part has an absorption layer which is provided on the lid part to absorb a gas in the internal space and a coating layer provided to coat the absorption layer.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016072345(A) |
申请公布日期 |
2016.05.09 |
申请号 |
JP20140198210 |
申请日期 |
2014.09.29 |
申请人 |
NIPPON DEMPA KOGYO CO LTD |
发明人 |
IWAI HISASHI |
分类号 |
H01L23/02;B81B3/00;B81C3/00;H01L29/84;H03H9/24 |
主分类号 |
H01L23/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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