发明名称 MEMS DEVICE AND MEMS DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To inhibit deterioration in gas adsorption capability in an adsorption layer and further inhibit a decrease in vacuum level of an internal space.SOLUTION: A MEMS device comprises: a substrate; an element part which is provided on the substrate and has a movable part; a joining part which is provided on the substrate to surround the element part; and a lid part whose substrate side surface is partially joined to the joining part to form an internal space including the element part. The lid part has a plurality of recesses on the substrate side surface at a portion opposite to the internal space and a film part on the substrate side surface at a portion including at least the plurality of recesses. The film part has an absorption layer which is provided on the lid part to absorb a gas in the internal space and a coating layer provided to coat the absorption layer.SELECTED DRAWING: Figure 1
申请公布号 JP2016072345(A) 申请公布日期 2016.05.09
申请号 JP20140198210 申请日期 2014.09.29
申请人 NIPPON DEMPA KOGYO CO LTD 发明人 IWAI HISASHI
分类号 H01L23/02;B81B3/00;B81C3/00;H01L29/84;H03H9/24 主分类号 H01L23/02
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