发明名称 DEFINED DOSING ATMOSPHERIC TEMPERATURE AND PRESSURE VAPOR DEPOSITION SYSTEM.
摘要 A closed chemical introduction system used to deliver active ingredients in liquid chemical to a chemical vapor deposition system includes a robust, moisture-free cartridge containing a defined dose of liquid chemical. The cartridge is placed on a mounting slot specially configured to receive the cartridge. Upon initiating the system, a first linear mechanical actuator securely holds the cartridge in the slot, while an extraction lance attached to a second linear mechanical actuator punctures the cartridge from the bottom, extracts the liquid chemical and delivers it to a vaporization chamber. The vaporization chamber evaporates the liquid chemical and delivers the vapors containing the active ingredients to the chemical vapor deposition system. The chemical vapor deposition system may include a treatment chamber, a conveyor, a compressed clean air system to provide separate treatment compartments within the chamber, a moisture system, a chemical vapor system, and a neutralization system to neutralize harmful byproducts.
申请公布号 MX2015014937(A) 申请公布日期 2016.05.09
申请号 MX20150014937 申请日期 2014.04.23
申请人 DIAMON FUSION INTERNATIONAL, INC. 发明人 RUSSELL C. SLAYBAUGH;MICHAEL STEPHEN METCALFE;ADAM ZAX;GUILLERMO SETA
分类号 C23C16/448 主分类号 C23C16/448
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