| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a silicon oxide layer which can improve polishing rate.SOLUTION: A polishing liquid composition for a silicon oxide layer contains water, cerium oxide particles, and compounds having amino group and sulfonate group and/or phosphonic acid group in molecule. In the polishing liquid composition, the ratio ([mol number of sulfonate group and/or phosphonic acid group]/[total surface area of the cerium oxide particles]) is 1.6×10-5.0×10mol/m.SELECTED DRAWING: None |
