| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing system capable of preventing penetration of outside air into the inside of an exhaust introduction chamber.SOLUTION: An exhaust switching apparatus 2 includes: an exhaust introduction chamber 60 into which exhaust from a chamber of a substrate processing apparatus is introduced; a drainage pipe 66 having a liquid seal trap 65 on a midway portion to drain liquid from the inside of the exhaust introduction chamber 60; a valve cleaning unit 96 and a partition wall cleaning unit 97 for supplying the liquid to the inside of the exhaust introduction chamber 60; and a first sealing liquid level sensor for detecting a liquid level of a sealing liquid in the liquid seal trap 65. A control device in the substrate processing apparatus, when a liquid level detected by the first sealing liquid level sensor is less than a lower limit liquid level, controls the cleaning units 96, 97 to supply the liquid to the inside of the exhaust introduction chamber 60, in order to supply the liquid to the liquid seal trap 65.SELECTED DRAWING: Figure 2 |
