| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition and producing method thereof and polishing method which can polish polishing objects such as element silicon, silicon compounds and metals, especially silicon nitride at high polishing rate.SOLUTION: A polishing composition contains colloidal silica having organic acid stabilized on the surface and a heterocyclic compound having two or more nitrogen atoms in the cycle, in which the heterocyclic compound is at least one of imidazole derivative and pyrazole derivative, or a five-membered ring compound. The organic acid is at least one kind selected from sulfonic acid, carboxylic acid, sulfinic acid and phosphonic acid, and the content of the heterocyclic compound is 0.01-1 mass%.SELECTED DRAWING: None |
