| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching system and an etching method which allow for long life of the devices and facility, and sustainability of etching quality, while suppressing consumption of the etchant.SOLUTION: An etching system 10 includes an etching section 142, an etchant supply section 144, a liquid mixing section 12, and a hydrofluoric acid regeneration device 18. The liquid mixing section 12 is connected with the etchant supply section 144, and is configured so that an etchant can be produced by mixing more than one kinds of liquid containing at least hydrofluoric acid. The hydrofluoric acid regeneration device 18 is configured to regenerate the hydrofluoric acid by using the reaction products of etching, and to supply the regenerated hydrofluoric acid to the liquid mixing section 12. The etchant of amount corresponding to the supply amount from the liquid mixing section 12 to the etchant supply section 144 is supplied from the etchant supply section 144 to the hydrofluoric acid regeneration device 18.SELECTED DRAWING: Figure 1 |
