| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can collect and use used process liquid.SOLUTION: A substrate processing apparatus comprises: a first tank for supplying a process liquid to a processing unit; first and third tanks for alternately collecting the process liquid used in the processing unit; a process liquid circulation system for alternately heating and circulating a low-temperature process liquid collected in the second and third tanks; and a process liquid replenishment system for replenishing the processing unit with the low-temperature process liquid in the second third tanks. A heater inserted in the process liquid circulation system has a high output due to necessity for increasing a temperature of the low-temperature process liquid. It is unnecessary to prepare high-output heaters for both of the second and third tanks because the heater inserted in the process liquid circulation system can be used by switching between the second and third tanks thereby to achieve cost down of the apparatus.SELECTED DRAWING: Figure 2 |
