发明名称 |
METHOD FOR FORMING RESIN PATTERN, METHOD FOR FORMING PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a resin pattern having high sensitivity and resolution and inhibiting generation of a residue, a method for forming a pattern, a cured film obtained from the resin pattern, and a liquid crystal display device, an organic EL display device and a touch panel display device including a pattern or a cured film obtained by the above pattern method.SOLUTION: A method for forming a resin pattern includes in the following order: an application step of applying a specific photosensitive resin composition on a substrate having a reflectance of 20% or more at a wavelength of 313 nm as a step 1; a drying step of forming a photosensitive resin composition layer as a step 2; an exposure step of exposing the layer along a pattern by using specific light radiated from an annular illumination device as a step 3; and a development step of developing the exposed photosensitive resin composition layer as a step 4.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016071243(A) |
申请公布日期 |
2016.05.09 |
申请号 |
JP20140202208 |
申请日期 |
2014.09.30 |
申请人 |
FUJIFILM CORP |
发明人 |
FUJIMOTO SHINJI;ANDO TAKESHI;SAKIDA KYOHEI |
分类号 |
G03F7/039;C08F212/14;C08L25/00;G02F1/1333;G02F1/1368;G03F7/004;G06F3/041;H01L21/027;H01L51/50;H05B33/10 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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