发明名称 METHOD FOR FORMING RESIN PATTERN, METHOD FOR FORMING PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a resin pattern having high sensitivity and resolution and inhibiting generation of a residue, a method for forming a pattern, a cured film obtained from the resin pattern, and a liquid crystal display device, an organic EL display device and a touch panel display device including a pattern or a cured film obtained by the above pattern method.SOLUTION: A method for forming a resin pattern includes in the following order: an application step of applying a specific photosensitive resin composition on a substrate having a reflectance of 20% or more at a wavelength of 313 nm as a step 1; a drying step of forming a photosensitive resin composition layer as a step 2; an exposure step of exposing the layer along a pattern by using specific light radiated from an annular illumination device as a step 3; and a development step of developing the exposed photosensitive resin composition layer as a step 4.SELECTED DRAWING: Figure 1
申请公布号 JP2016071243(A) 申请公布日期 2016.05.09
申请号 JP20140202208 申请日期 2014.09.30
申请人 FUJIFILM CORP 发明人 FUJIMOTO SHINJI;ANDO TAKESHI;SAKIDA KYOHEI
分类号 G03F7/039;C08F212/14;C08L25/00;G02F1/1333;G02F1/1368;G03F7/004;G06F3/041;H01L21/027;H01L51/50;H05B33/10 主分类号 G03F7/039
代理机构 代理人
主权项
地址