发明名称 CLEANING METHOD FOR SUSCEPTOR
摘要 PROBLEM TO BE SOLVED: To prevent a cleaning gas from being wasted, by shortening an etching time without generating a deposit that is deposited on a carbon susceptor, left from removal.SOLUTION: A cleaning method includes the steps of: heating a susceptor 3 while rotating it around an axis and supplying the predetermined cleaning gas into a reactor 2; repeating the process of detecting surface temperatures during a first period and a second period following the first period and measuring a temperature difference between the surface temperatures until the temperature difference becomes equal to or more than a first temperature difference; repeating the process of detecting the surface temperatures of the susceptor during the first period and the second period following the first period after the temperature difference becomes equal to or more than the first temperature difference and measuring a temperature difference between the surface temperatures until the temperature difference becomes equal to or less than a second temperature difference; and stopping supplying the cleaning gas after the lapse of a predetermined time from the temperature difference becoming equal to or less than the second temperature difference.SELECTED DRAWING: Figure 2
申请公布号 JP2016072585(A) 申请公布日期 2016.05.09
申请号 JP20140203789 申请日期 2014.10.02
申请人 GLOBALWAFERS JAPAN CO LTD 发明人 WATANABE HIDENORI;NOMURA HISAO
分类号 H01L21/205;C23C16/44;H01L21/3065 主分类号 H01L21/205
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