| 摘要 |
PROBLEM TO BE SOLVED: To provide a conductive polymeric composition that has excellent antistatic performance and excellent application property without adversely influencing a resist and that can be suitably used for lithography using an electron beam or the like.SOLUTION: The conductive polymeric composition comprises a polyaniline-based conductive polymer (A) having a repeating unit represented by general formula (1), a polyanion (B) and an amino acid (C). In the formula (1), Rto Reach independently represent a hydrogen atom, a halogen atom, or a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally having a heteroatom; or Rand R, or Rand Rmay be bonded to each other to form a ring.SELECTED DRAWING: None |
