| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing stably a large-area hydroxide thin film by a sputtering method, and to provide the large-area hydroxide thin film.SOLUTION: A sputtering device can provide a method for manufacturing stably a hydroxide thin film, and a large-area hydroxide thin film, by adding a steam supply mechanism and a cooling mechanism for controlling a steam partial pressure to a conventional sputtering device.SELECTED DRAWING: Figure 1 |
