CONTROL APPARATUS FOR SUBSTRATE LIQUID PROCESSING AND LIQUID PROCESSING APPARATUS FOR SUBSTRATE USING THE SAME AND LIQUID PROCESSING METHOD FOR SUBSTRATE USING THE SAME

摘要

The present invention relates to a control device for the liquid processing of a substrate and a device and a method to perform the liquid processing of a substrate by using the same. The control device for the liquid processing of a substrate, capable of controlling the atmosphere of a chamber for the liquid processing of a substrate, includes: a measuring part measuring and sensing an atmosphere change in the chamber; a supply part supplying atmosphere gas to the chamber; an exhaust part discharging the atmosphere gas from the chamber; and a control part controlling the atmosphere of the chamber by controlling a discharge amount of the exhaust part and a supply amount of the supply part based on a sensing result of the measuring part. Therefore, the present invention is capable of improving the efficiency of liquid processing and reducing time for liquid processing by keeping the atmosphere of the chamber constant by controlling the atmosphere of the chamber through the exhaust part and the supply part by sensing an atmosphere change in the chamber through the measuring part.