| 摘要 |
Provided are: a substrate cleaning roller capable of cleaning the outermost edge section of a substrate; and a substrate cleaning device using said substrate cleaning roller. This substrate cleaning device (10) comprises: a spindle (11) that holds a substrate (S); a lower substrate cleaning roller (13) that has a circular cylindrical shape, and that is for scrub-cleaning a surface of the substrate (S) by contacting the substrate (S) such that the length direction thereof is parallel to the surface of the substrate (S) and rotating about a rotation axis along the length direction; a vertical drive mechanism that presses the lower substrate cleaning roller (13) against the lower surface of the substrate (S) such that the length direction is horizontal with the surface of the substrate (S); and a rotation drive mechanism that rotates, about the rotation axis, the lower substrate cleaning roller (13) pressed against the lower surface of the substrate (S) by the vertical drive mechanism. The lower substrate cleaning roller (13) includes, on at least one end side of the length direction, an edge nodule (135) having an inclined surface (1351) that comes into contact with a side section (R), which is the outermost edge section of a beveled section (B) of the peripheral edge of the substrate (S), when the lower substrate cleaning roller (13) is in contact with the substrate (S). |
