SELF-ASSEMBLING POLYMERIC MATERIAL, SELF-ASSEMBLED FILM, METHOD FOR PRODUCING SELF-ASSEMBLED FILM, AND IRREGULAR PATTERN

摘要

The purpose of the present invention is to provide: a self-assembling polymeric material whereby it becomes possible to reduce defects formed at microphase separation-insufficient sites and therefore it becomes possible to form a fine repeated pattern; a self-assembled film; a method for producing a self-assembled film; and an irregular pattern. The self-assembling polymeric material according to the present invention is characterized by comprising a polymeric compound which contains both a constituent unit represented by general formula (1) and a constituent unit represented by general formula (2). (In formula (2), X represents a carbon atom or a silicon atom; and p represents an integer of 1 to 5 inclusive.)