MASK PLATE

摘要

Disclosed is a mask plate (1). The mask plate (1) comprises a transparent substrate (8). The transparent substrate (8) is provided with a semi-transparent film layer (7) and a light blocking layer (9) to form a lightproof area A, a semi-transparent area B and a fully transparent area C. The transparent substrate (8) is also provided with a light extinction film layer (4) on the periphery of the fully transparent area C for reducing the intensity of ultraviolet light (3) transmitted through the periphery of the fully transparent area C. The size of a via hole formed by exposure of the mask plate is less affected by the thickness variation of a photoresist on the periphery of a via hole.