| 摘要 |
[Problem] To provide a laminate film and an electrode substrate film which have excellent etching properties and in which a circuit pattern that has been subjected to etching processing is difficult to see under high-intensity lighting, and to provide a production method therefor. [Solution] Provided is a laminate film composed of a transparent substrate 60 made of a resin film and laminated layers provided on at least one surface of the transparent substrate, the laminate film being characterized in that: the laminated layers include metallic absorption layers 61, 63, which are the first layers when counting from the transparent substrate, and metallic layers (62, 65), (64, 66), which are the second layers when counting from the transparent substrate; the metallic absorption layers are formed by a reactive sputtering method using an oxygen-containing reactive gas and a metal target made of elemental Ni or an alloy containing two or more elements selected from Ni, Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, and Cu; and the reactive gas contains hydrogen. |
