| 发明名称 |
PHOTOSENSITIVE COMPOSITION, PATTERNED SUBSTRATE, CELL CULTURE SUPPORT, AND CULTURED CELL PRODUCTION METHOD |
| 摘要 |
The present invention provides a photosensitive composition which includes a copolymer containing constitutional units represented by formulae (1)-(3), a photoacid generator, and a solvent (the definition of the groups in the formulae is as described in the specification). |
| 申请公布号 |
WO2016068271(A1) |
申请公布日期 |
2016.05.06 |
| 申请号 |
WO2015JP80650 |
申请日期 |
2015.10.30 |
| 申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD.;TOYAMA PREFECTURE;TOKYO OHKA KOGYO CO., LTD.;TOKYO WOMEN'S MEDICAL UNIVERSITY |
发明人 |
KISHIOKA, TAKAHIRO;YOKOYAMA, YOSHIYUKI;ITOGA, KAZUYOSHI;OKANO, TERUO;KUMASHIRO, YOSHIKAZU;KINOSHITA, YOHEI |
| 分类号 |
G03F7/038;C08F220/56;C12M3/00 |
主分类号 |
G03F7/038 |
| 代理机构 |
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