发明名称 |
ION IMPLANTATION PROCESSES AND APPARATUS |
摘要 |
An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus ( 10 ), comprising: an ion source chamber (12); and a consumable structure in or associated with the ion source chamber (12), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line (14) comprising a pipe or conduit having an interior layer formed of a solid dopant source material. |
申请公布号 |
WO2016069516(A1) |
申请公布日期 |
2016.05.06 |
申请号 |
WO2015US57444 |
申请日期 |
2015.10.27 |
申请人 |
ENTEGRIS, INC. |
发明人 |
BYL, OLEG;SWEENEY, JOSEPH, D. |
分类号 |
H01J27/02;H01J37/08;H01J37/317;H01L21/265 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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