发明名称 NONVOLATILE MEMORY DEVICES HAVING SINGLE-LAYERED GATES
摘要 A nonvolatile memory device includes an active region extending in a first direction, a first single-layered gate intersecting the active region and extending in a second direction, a second single-layered gate intersecting the active region and extending in the second direction, and a selection gate intersecting the active region. The selection gate includes a first selection gate main line and a second selection gate main line that intersect the active region to be parallel with the first and second single-layered gates, a selection gate interconnection line that connects a first end of the first selection gate main line to a first end of the second selection gate main line, and a selection gate extension that extends from a portion of the selection gate interconnection line to be disposed between first ends of the first and second single-layered gates.
申请公布号 US2016126247(A1) 申请公布日期 2016.05.05
申请号 US201514678650 申请日期 2015.04.03
申请人 SK hynix Inc. 发明人 KIM Jung Hoon;PARK Sung Kun;KIM Nam Yoon
分类号 H01L27/115;H01L23/528;H01L29/423;H01L29/06 主分类号 H01L27/115
代理机构 代理人
主权项 1. A nonvolatile memory device comprising: an active region extending in a first direction; a first single-layered gate intersecting the active region and extending in a second direction; a second single-layered gate intersecting the active region to be spaced apart from the first single-layered gate in the first direction and extending in the second direction; and a selection gate including a first selection gate main line and a second selection gate main line that intersect the active region to be parallel with the first and second single-layered gates, a selection gate interconnection line that connects a first end of the first selection gate main line to a first end of the second selection gate main line, and a selection gate extension that extends from a portion of the selection gate interconnection line to be disposed between first ends of the first and second single-layered gates, wherein the first selection gate main line is at a side of the first single-layered gate, opposite to the second single-layered gate; and wherein the second selection gate main line is at a side of the second single-layered gate, opposite to the first single-layered gate.
地址 Gyeonggi-do KR