发明名称 TARGET PROCESSING UNIT
摘要 The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.
申请公布号 US2016126055(A1) 申请公布日期 2016.05.05
申请号 US201614992049 申请日期 2016.01.11
申请人 Mapper Lithography IP B.V. 发明人 Koning Johan Joost;van den Bergen David Johannes
分类号 H01J37/02;H01J37/20 主分类号 H01J37/02
代理机构 代理人
主权项 1. Target processing unit comprising: a vacuum chamber for accommodating a target to be processed; a projection column within the vacuum chamber for generating a beam and projecting the beam towards the target; a positioning system within the vacuum chamber for supporting the target, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber; a first conduit arrangement for connecting the projection column to corresponding equipment external to the vacuum chamber; and a second conduit arrangement distinct from the first conduit arrangement for connecting the positioning system to corresponding equipment external to the vacuum chamber,wherein the first conduit arrangement extends through an upper side of the vacuum chamber, and wherein the second conduit arrangement extends through a lower side of the vacuum chamber.
地址 Delft NL