发明名称 SILICONE RESIN, RESIN COMPOSITION, RESIN FILM, SEMICONDUCTOR DEVICE, AND MAKING METHOD
摘要 A silicone resin comprising constitutional units represented by formula (1) and having a Mw of 3,000-500,000 contains 10-50 wt % of (A-1) a first silicone resin having a silicone content of 10-40 wt % and (A-2) a second silicone resin having a silicone content of 50-80 wt %. A resin composition comprising the silicone resin can be formed in film form, and it possesses satisfactory covering or encapsulating performance to large size/thin wafers. The resin composition or resin film ensures satisfactory adhesion, low warpage, and wafer protection. The resin film is useful in wafer-level packages.;
申请公布号 US2016122586(A1) 申请公布日期 2016.05.05
申请号 US201514918080 申请日期 2015.10.20
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KONDO Kazunori;ICHIOKA Yoichiro;KATO Hideto
分类号 C09D183/06;B32B27/08;B32B27/26;B32B27/20;H01L23/29;B32B37/24;B32B37/00;H01L21/56;H01L21/78;B29C65/00;B32B27/28 主分类号 C09D183/06
代理机构 代理人
主权项 1. A silicone resin comprising constitutional units represented by the compositional formula (1) and having a weight average molecular weight of 3,000 to 500,000, containing (A-1) a first silicone resin having a silicone content of 10 to 40% by weight of the first silicone resin, and (A-2) a second silicone resin having a silicone content of 50 to 80% by weight of the second silicone resin, the weight content of first silicone resin (A-1) being 10 to 50% by weight of the total weight of the silicone resin, wherein R1 to R4 are each independently a monovalent C1-C8 hydrocarbon group, excluding that R3 and R4 are methyl at the same time, m and n each are an integer of 0 to 300, a and b are positive numbers, a+b=1, X is a divalent linking group having the general formula (2) or (3), c indicative of moles of the group of formula (2) and d indicative of moles of the group of formula (3) are in the range of 0/1≦d/c≦1/1, wherein V is a divalent organic group selected from the following: p is 0 or 1, R5 is hydrogen or methyl, f is an integer of 0 to 7, R6 and R7 are each independently C1-C4 alkyl or alkoxy, h is 0, 1 or 2, wherein R3 and R4 are each independently a monovalent C1-C8 hydrocarbon group, excluding that R3 and R4 are methyl at the same time, q and r each are an integer of 0 to 300, R8 is hydrogen or methyl, and k is an integer of 0 to 7.
地址 Tokyo JP