发明名称 PHOTORESIST OVERCOAT COMPOSITIONS
摘要 Photoresist overcoat compositions are provided. The compositions comprise: a matrix polymer, an additive polymer a basic quencher and an organic solvent. The additive polymer has a lower surface energy than a surface energy of the matrix polymer, and the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition. The compositions have particular applicability in the semiconductor manufacturing industry for use in negative tone development processes.
申请公布号 US2016122574(A1) 申请公布日期 2016.05.05
申请号 US201514927357 申请日期 2015.10.29
申请人 Rohm and Haas Electronic Materials LLC 发明人 LEE Choong-Bong;CAPORALE Stefan J.;DeSISTO Jason A.;PARK Jong Keun;LIU Cong;XU Cheng-Bai;ANDES Cecily
分类号 C09D133/12;C09D139/04;C09D133/26;G03F7/11 主分类号 C09D133/12
代理机构 代理人
主权项 1. A photoresist overcoat composition, comprising: a matrix polymer comprising a unit formed from a monomer of the following general formula (I): wherein: R1 is chosen from hydrogen and optionally substituted C1 to C3 alkyl; R2 is chosen from optionally substituted C1 to C15 alkyl; X1 is oxygen, sulfur or is represented by the formula NR3, wherein R3 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and Z1 is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR4— wherein R4 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and an additive polymer comprising a unit formed from a monomer of the following general formula (II) or (III): wherein: R10 is chosen from hydrogen and optionally substituted C1 to C3 alkyl; R11 is chosen from optionally substituted C1 to C15 alkyl; X2 is oxygen, sulfur or is represented by the formula NR12, wherein R12 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and Z3 is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —NHSO2—, —COO— and —CONR13— wherein R13 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; wherein: R14 is chosen from hydrogen and optionally substituted C1 to C3 alkyl; R15 is independently chosen from optionally substituted C1 to C15 alkyl; X3 is oxygen, sulfur or is represented by the formula NR16, wherein R16 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; Z4 is a single bond or a spacer unit chosen from optionally substituted aliphatic and aromatic hydrocarbons, and combinations thereof, optionally with one or more linking moiety chosen from —O—, —S—, —COO— and —CONR17—, wherein R17 is chosen from hydrogen and optionally substituted C1 to C10 alkyl; and n is an integer from 0 to 2; a basic quencher; and an organic solvent; wherein the additive polymer has a lower surface energy than a surface energy of the matrix polymer, and wherein the additive polymer is present in the overcoat composition in an amount of from 1 to 20 wt % based on total solids of the overcoat composition.
地址 Marlborough MA US