发明名称 Inkjet discharge method, pattern formation method, and pattern
摘要 The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
申请公布号 US2016122563(A1) 申请公布日期 2016.05.05
申请号 US201514757424 申请日期 2015.12.23
申请人 FUJIFILM Corporation 发明人 Goto Yuichiro;Oomatsu Tadashi;Kitagawa Hirotaka;Enomoto Yuichiro;Kodama Kenichi
分类号 C09D11/30;B41J2/01;C09D11/106 主分类号 C09D11/30
代理机构 代理人
主权项 1. An inkjet discharge method comprising discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, wherein the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or greater than 4% by mass of the composition, (b) having a surface tension of 25 mN/m to 35 mN/m, and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of equal to or less than 5% by mass of the composition.
地址 Tokyo JP