发明名称 |
Inkjet discharge method, pattern formation method, and pattern |
摘要 |
The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition. |
申请公布号 |
US2016122563(A1) |
申请公布日期 |
2016.05.05 |
申请号 |
US201514757424 |
申请日期 |
2015.12.23 |
申请人 |
FUJIFILM Corporation |
发明人 |
Goto Yuichiro;Oomatsu Tadashi;Kitagawa Hirotaka;Enomoto Yuichiro;Kodama Kenichi |
分类号 |
C09D11/30;B41J2/01;C09D11/106 |
主分类号 |
C09D11/30 |
代理机构 |
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代理人 |
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主权项 |
1. An inkjet discharge method comprising discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL,
wherein the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or greater than 4% by mass of the composition, (b) having a surface tension of 25 mN/m to 35 mN/m, and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of equal to or less than 5% by mass of the composition. |
地址 |
Tokyo JP |