发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid. |
申请公布号 |
US2016124321(A1) |
申请公布日期 |
2016.05.05 |
申请号 |
US201614993810 |
申请日期 |
2016.01.12 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Leonardus Hendricus VERSPAY Jacobus Johannus;JANSEN Hans;STAVENGA Marco Koert |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
|
主权项 |
1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid, the apparatus comprising a liquid confinement structure configured to confine the liquid to a space adjacent the substrate, wherein the space is smaller in plan than the substrate and is substantially polygonal in plan substantially parallel to the substrate. |
地址 |
Veldhoven NL |