A POLYMERIC FILM COATING METHOD ON A SUBSTRATE BY DEPOSITING AND SUBSEQUENTLY POLYMERIZING A MONOMERIC COMPOSITION BY PLASMA TREATMENT

摘要

The present invention relates to a method for coating a substrate comprising the following steps : a) depositing a polymerizable composition on said substrate, the composition being selected from the following compositions: a composition (A) containing, as an essential component: a least one epoxy monomer (i) and/or at least one silicone epoxy monomer (ii); or a composition (B) containing as an essential component a least one silicone epoxy monomer (ii) and at least one monomer containing at least one ethylenic unsaturation (iii); b) polymerizing said composition by plasma treatment. The coating obtained with this method is substantially free from ionic photocatalysts, and the step (b) is carried out at atmospheric pressure.