发明名称 METHOD FOR CULTIVATING BETA-Ga2O3 SINGLE CRYSTAL, AND BETA-Ga2O3-SINGLE-CRYSTAL SUBSTRATE AND METHOD FOR PRODUCING SAME
摘要 Provided is one embodiment which is a method for growing a β-Ga2O3-based single crystal including contacting a flat plate-shaped seed crystal with a Ga2O3-based melt, and pulling up the seed crystal such that a flat plate-shaped β-Ga2O3-based single crystal having a principal surface which intersects a surface is grown without inheriting a crystal information of a vaporized material of the Ga2O3-based melt adhered to the principal surface of the seed crystal, wherein when growing the β-Ga2O3-based single crystal, a shoulder of the β-Ga2O3-based single crystal is widened in a thickness direction (t) thereof.
申请公布号 US2016122899(A1) 申请公布日期 2016.05.05
申请号 US201414890723 申请日期 2014.05.02
申请人 TAMURA CORPORATION ;KOHA CO., LTD. 发明人 KOSHI Kimiyoshi;WATANABE Shinya
分类号 C30B15/34;C30B29/16;C30B15/36 主分类号 C30B15/34
代理机构 代理人
主权项 1. A method for growing a β-Ga2O3-based single crystal, comprising: contacting a flat plate-shaped seed crystal with a Ga2O3-based melt; and pulling up the seed crystal such that a flat plate-shaped β-Ga2O3-based single crystal comprising a principal surface that intersects a plane is grown without inheriting a crystal information of a vaporized material of the Ga2O3-based melt adhered to the principal surface of the seed crystal, wherein, when growing the β-Ga2O3-based single crystal, a shoulder of the β-Ga2O3-based single crystal is widened only in a thickness direction thereof.
地址 Tokyo JP