| 摘要 |
According to the invention there is a clamp assembly for clamping an outer peripheral portion of a substrate to a support in a plasma processing chamber of the type in which an RF bias power is applied to the support during the plasma processing of the substrate, the clamp assembly comprising:
an outer clamp member; and
an inner clamp member which is received by the outer clamp member, the inner clamp member defining an aperture which exposes the substrate to the plasma processing;
in which the outer clamp member has an inner portion terminating in an inner edge, wherein the inner portion is spaced apart from the inner clamp member. |
