| 摘要 |
The present invention provides a method for producing a pattern. The method comprises the steps of: (step 1) preparing a first polymer substrate having a pattern formed thereon; (step 2) filling the pattern of the first polymer substrate prepared in step 1 with a second polymer, and semi-hardening the second polymer; and (step 3) producing a thin film on a pattern-containing pattern of the first polymer substrate including the semi-hardened second polymer from step 2, and forming a wrinkle or folding structure. According to the method for producing a pattern of the present invention, a difference in hardness is made in a part on which a pattern is to be formed, so a position of a pattern including a wrinkle structure or a folding structure may be adjusted. A position of a pattern may be controlled, so the method may be applied to a scheme utilized in the fields such as the production of a pattern structure requiring precise alignment, the production of a three-dimensional metal pattern, the production of a micro/nano structure, the production of a stimulation-sensitive device, and the development of a flexible device. |
