发明名称 PRINTED CHEMICAL MECHANICAL POLISHING PAD
摘要 A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.
申请公布号 EP2842157(A4) 申请公布日期 2016.05.04
申请号 EP20130782401 申请日期 2013.04.05
申请人 APPLIED MATERIALS, INC. 发明人 BAJAJ, RAJEEV;CHIN, BARRY, LEE;LEE, TERRANCE, Y.
分类号 H01L21/304;B24B37/04;B24B37/26;B24D18/00;B29C67/00;B29K75/00;B29K509/02 主分类号 H01L21/304
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