Mask-aware routing and resulting device

摘要

Methods for routing a metal routing layer based on mask design rules and the resulting devices are disclosed. Embodiments may include laying-out continuous metal lines in a semiconductor design layout, and routing, by a processor, a metal routing layer using the continuous metal lines according to placement of cut or block masks based on cut or block mask design rules.

主权项

1. A method comprising:
laying-out continuous metal lines in a semiconductor design layout; routing, by a processor, a metal routing layer using the continuous metal lines according to placement of cut or block masks based on cut or block mask design rules; determining locations of the cut or block masks to generate signal lines from the continuous metal lines to connect cells within the semiconductor design layout; checking whether the placement of the cut or block masks satisfies the cut or block mask design rules; determining that two candidate cut or block mask polygons for routing the metal routing layer would violate the cut or block mask design rules; and combining the two candidate cut or block mask polygons into a single cut or block mask polygon to satisfy the cut or block mask design rules.