Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device

摘要

Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor including a functional group at a terminal end thereof, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device using the same.

主权项

1. A positive photosensitive resin composition, comprising:
(A) a polybenzoxazole precursor including a functional group at a terminal end, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, wherein the functional group is represented by the following Chemical Formula 1: wherein, in the above Chemical Formula 1, L1 and L2 are the same or different and are each independently a single bond, substituted or unsubstituted C1 to C20 alkylene, substituted or unsubstituted C1 to C20 arylene, substituted or unsubstituted C1 to C20 heteroarylene, or a combination thereof, and X is substituted or unsubstituted C1 to C20 alkyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C2 to C20 alkenyl, substituted or unsubstituted C6 to C20 aryl, substituted or unsubstituted C1 to C20 heteroaryl, —C(O)R wherein R is substituted or unsubstituted C1 to C20 aryl, or a combination thereof.