Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

摘要

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable away from below the optical element. While the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.

主权项

1. An immersion exposure apparatus for exposing a substrate with a light beam via an optical element and immersion liquid, the apparatus comprising:
a first stage for mounting the substrate and that is movable relative to the optical element; and a second stage that is independently movable relative to the first stage and that is positionable away from below the optical element, wherein while the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.