发明名称 Lithographic printing plate precusor
摘要 A negative-working lithographic printing plate precursor includes a coating containing a photopolymerizable layer and optionally an intermediate layer between the photopolymerizable layer and the support, wherein the coating further includes a polysiloxane, the polysiloxane being present in the photopolymerizable layer and/or in the optional intermediate layer, and the polysiloxane is obtained by reacting at least one organosilicon compound represented by the general Formula (I) and at least one organosilicon compound represented by the general Formula (II):;
申请公布号 US9329479(B2) 申请公布日期 2016.05.03
申请号 US201314390427 申请日期 2013.03.20
申请人 AGFA GRAPHICS NV 发明人 Loccufier Johan;Steenackers Marin;Verbrugghe Sam
分类号 G03F7/30;G03F7/075;B41C1/10;G03F7/027;G03F7/11;G03F7/40;G03F7/004 主分类号 G03F7/30
代理机构 Keating and Bennett, LLP 代理人 Keating and Bennett, LLP
主权项 1. A method of preparing a negative-working lithographic printing plate precursor comprising the steps of: providing a support having a hydrophilic surface or which is provided with a hydrophilic layer; providing a coating on the support, the coating including a photopolymerizable layer and optionally an intermediate layer between the photopolymerizable layer and the support, the coating further including a polysiloxane present in the photopolymerizable layer and/or in the optional intermediate layer; wherein the polysiloxane is obtained by reacting a first organosilicon compound represented by the general Formula (I) and a second organosilicon compound represented by the general Formula (II): R1 represents a group including at least one free radical polymerizable group; R2, R3, R6, and R7 independently represent an alkoxy, aryloxy, or an acyloxy group, or an optionally substituted alkyl, cycloalkyl, alkenyl, alkynyl, aryl, or heteroaryl group; R4 and R8 independently represent an optionally substituted alkyl, cycloalkyl, alkenyl, alkynyl, aryl, heteroaryl group, or acyl group; R5 represents a hydrophilic group selected from a carboxylic acid or a salt thereof, a sulphonic acid or a salt thereof, a sulphuric acid or a monoester or a salt thereof, a hydrocarbon group substituted with at least one hydroxyl group, an oligoalkylene oxide group, a quaternary ammonium group, a phosphonium group, or combinations thereof; and L1 represents a di- or trivalent linking group; and R1 and L1 are bonded to the silicon atom via a carbon atom.
地址 Mortsel BE