| 主权项 |
1. A deposition system comprising:
a distributor configured to vaporize a semiconductor material and direct the vaporized semiconductor material through at least one distribution hole in the distributor for deposition on a substrate, the distributor configuration including a five-sided volume, two sides of said volume being defined by a pair of tubes, two sides of said volume being defined by spacers each of which has an hour glass-shape, and a backcap, the distributor volume having an outlet across from said backcap and toward the substrate; a first electrical power supply configured to heat the distributor; and a plasma source having an electrode configured to generate a plasma, wherein the electrode is driven by a second electrical power supply electrically independent from the first electrical power supply and the plasma source is positioned between the at least one distribution hole in the distributor and the substrate to expose the vaporized semiconductor material to a plasma prior to deposition on the substrate. |
